OPTIMIZATION OF THE REMOVAL OF PERSISTENT ORGANIC COMPOUNDS THROUGH THE PHOTO-FENTON PROCESS

  • César Gutiérrez Autor
  • Alex Pilco Autor
DOI: https://doi.org/10.37761/rsqp.v86i1.273
Keywords: Photo-Fenton, textile wastewater, experiment design, chemical oxygen demand

Abstract

The response surface methodology was applied to evaluate the optimal experimental conditions to remove persistent organic compounds from a synthetic textile wastewater using a batch photochemical reactor on a laboratory scale. Four factors at three levels were studied: Fenton H2O2/Fe2+ reagent ratio (11,25, 18,75, 26,25 mg/L/mg/L), UV lamp power (4, 11, 18 W), pH (2, 3, 4) and treatment time (60, 120, 180 min). The optimum levels found for the four factors were: ratio of Fenton H2O2/Fe2+ reagents equal to 17 mg/L/mg/L, UV lamp power equal to 4 W, pH equal to 3 and treatment time of 180 min. It was found that the photo- Fenton process is very effective in treating synthetic textile wastewater, with a removal of 86 %, with respect to COD.

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Author Biographies

César Gutiérrez, Autor

Faculty of Chemical Engineering, Universidad Nacional del Callao, Av. Juan Pablo II 306, Callao 2, Perú,

Alex Pilco, Autor

Faculty of Chemical and Textile Engineering, Universidad Nacional de Ingeniería

Published
2020-03-31
Issue
Vol. 86 No. 1 (2020): Journal of Sociedad Química del Perú
Section
Artículos

Copyright (c) 2020 Sociedad Química del Perú

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This work is licensed under a Creative Commons Attribution 4.0 International License.

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